Design and fabrication considerations in developing high-Q MEMS capacitors and inductors

Author

Rais-Zadeh, Mina

Author_Institution

Solid-State Lab., Univ. of Michigan, Ann Arbor, MI, USA

fYear

2011

fDate

17-19 Jan. 2011

Firstpage

161

Lastpage

164

Abstract

Despite great advancement in micromachining techniques, design and fabrication of high-Q tunable capacitors and inductors remain to be a challenging task. This paper discusses the design and fabrication considerations in developing high-Q fixed and tunable micro-electromechanical capacitors and inductors. Electrostatic actuation mechanism is employed for tuning the value of passives. The measurement results of several high-Q capacitors and inductors fabricated on silicon substrate are presented, and a number of research directions to improve the performance of tunable passives are proposed.

Keywords

Q-factor; capacitors; electrostatic actuators; inductors; micromachining; micromechanical devices; Si; electrostatic actuation mechanism; fixed microelectromechanical capacitor; inductor; micromachining technique; tunable microelectromechanical capacitor; Capacitors; Fabrication; Inductors; Micromechanical devices; Substrates; Switches; Tuning; Passives; quality factor; tunable capacitor; tunable inductors;

fLanguage

English

Publisher

ieee

Conference_Titel

Silicon Monolithic Integrated Circuits in RF Systems (SiRF), 2011 IEEE 11th Topical Meeting on

Conference_Location

Phoenix, AZ

Print_ISBN

978-1-4244-8060-9

Type

conf

DOI

10.1109/SIRF.2011.5719335

Filename

5719335