DocumentCode
2599695
Title
Techniques for nano-scale deformation measurement
Author
Fei, Su ; Yaofeng, Sun ; Xunqing, Shi ; Stephen, Wong Chee Khuen
Author_Institution
Singapore Inst. of Manuf. Technol., Singapore
fYear
2004
fDate
8-10 Dec. 2004
Firstpage
729
Lastpage
734
Abstract
Deformation measurement of mechanical-electrical devices is important for their reliability evaluation. However, with the development of fabrication technology, sizes of mechanical-electrical devices are reduced to micro or even nano-scale. Correspondingly, testing resolution of the required metrology techniques must be improved to the same or even higher level. The commonly used characterization facility with nano-scale resolution is STM/AFM/SEM etc. In this paper, some metrology technologies based on these facilities for nano-scale deformation measurement, e.g. AFM/SEM moire and AFM/SEM digital speckle correlation are introduced, including their principles, advantages and disadvantages. Their applications in the deformation/strain measurement of MEMS and IC packages are highlighted.
Keywords
deformation; integrated circuit measurement; integrated circuit packaging; micromechanical devices; nanotechnology; strain measurement; AFM/SEM digital speckle correlation; AFM/SEM moire; IC packages; MEMS; fabrication technology; mechanical-electrical devices; metrology techniques; nano-scale deformation measurement; reliability evaluation; strain measurement; testing resolution; Application specific integrated circuits; Fabrication; Integrated circuit packaging; Mechanical variables measurement; Metrology; Micromechanical devices; Nanoscale devices; Speckle; Strain measurement; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference, 2004. EPTC 2004. Proceedings of 6th
Print_ISBN
0-7803-8821-6
Type
conf
DOI
10.1109/EPTC.2004.1396703
Filename
1396703
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