• DocumentCode
    2599695
  • Title

    Techniques for nano-scale deformation measurement

  • Author

    Fei, Su ; Yaofeng, Sun ; Xunqing, Shi ; Stephen, Wong Chee Khuen

  • Author_Institution
    Singapore Inst. of Manuf. Technol., Singapore
  • fYear
    2004
  • fDate
    8-10 Dec. 2004
  • Firstpage
    729
  • Lastpage
    734
  • Abstract
    Deformation measurement of mechanical-electrical devices is important for their reliability evaluation. However, with the development of fabrication technology, sizes of mechanical-electrical devices are reduced to micro or even nano-scale. Correspondingly, testing resolution of the required metrology techniques must be improved to the same or even higher level. The commonly used characterization facility with nano-scale resolution is STM/AFM/SEM etc. In this paper, some metrology technologies based on these facilities for nano-scale deformation measurement, e.g. AFM/SEM moire and AFM/SEM digital speckle correlation are introduced, including their principles, advantages and disadvantages. Their applications in the deformation/strain measurement of MEMS and IC packages are highlighted.
  • Keywords
    deformation; integrated circuit measurement; integrated circuit packaging; micromechanical devices; nanotechnology; strain measurement; AFM/SEM digital speckle correlation; AFM/SEM moire; IC packages; MEMS; fabrication technology; mechanical-electrical devices; metrology techniques; nano-scale deformation measurement; reliability evaluation; strain measurement; testing resolution; Application specific integrated circuits; Fabrication; Integrated circuit packaging; Mechanical variables measurement; Metrology; Micromechanical devices; Nanoscale devices; Speckle; Strain measurement; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference, 2004. EPTC 2004. Proceedings of 6th
  • Print_ISBN
    0-7803-8821-6
  • Type

    conf

  • DOI
    10.1109/EPTC.2004.1396703
  • Filename
    1396703