DocumentCode :
2599699
Title :
Radiochemical Study on Lateral Ion Migration in Insulating Substrates for Thin Film Microcircuits
Author :
Choi, S.S.
Author_Institution :
Philco Applied Research Laboratory, Philco Corporation, Blue Bell, Pennsylvania
fYear :
1965
fDate :
Nov. 1965
Firstpage :
408
Lastpage :
421
Keywords :
Electric resistance; Glass; Insulation; Isotopes; Motion detection; Resistors; Semiconductor thin films; Stress; Substrates; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics of Failure in Electronics, 1965. Fourth Annual Symposium on the
Conference_Location :
Chicago, IL, USA
ISSN :
0097-2088
Type :
conf
DOI :
10.1109/IRPS.1965.362336
Filename :
4207693
Link To Document :
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