DocumentCode :
2600261
Title :
Degradation of Mis Devices Under Electron Bombardment
Author :
Zaininger, K H
Author_Institution :
RCA Laboratories, Princeton, N. J.
fYear :
1966
fDate :
Nov. 1966
Firstpage :
328
Lastpage :
348
Abstract :
The behavior and physics of failure of MIS devices under irradiation with energetic electrons was investigated. It was found that the bombardment usually results in the introduction of positive charge in the insulator. This effect is explained by a physical model which involves interaction of secondary electrons with the insulator lattice to generate electron-hole pairs and predominant trapping of holes in the insulator. The dependence of the radiation sensitivity on pre-bombardment surface state density, device parameters, and fabrication procedure, as well as the annealing behavior was studied.
Keywords :
Degradation; Electrons; Hafnium; Indium tin oxide; MIS devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics of Failure in Electronics, 1966. Fifth Annual Symposium on the
Conference_Location :
Columbus, OH, USA
ISSN :
0097-2088
Type :
conf
DOI :
10.1109/IRPS.1966.362370
Filename :
4207730
Link To Document :
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