DocumentCode
2600294
Title
Petri net-based scheduling analysis of dual-arm cluster tools with wafer revisiting
Author
Qiao, Yan ; Wu, NaiQi ; Zhou, MengChu
Author_Institution
Dept. of Ind. Eng., Guangdong Univ. of Technol., Guangzhou, China
fYear
2012
fDate
20-24 Aug. 2012
Firstpage
206
Lastpage
211
Abstract
With wafer revisit, it is complicated to schedule cluster tools in semiconductor fabrication. In wafer fabrication processes, such as atomic layer deposition (ALD), the wafers need to visit some process modules for a number of times. The existing swap-based strategy can be used to operate a dual-arm cluster tool for such a process. It results in a 3-wafer cyclic schedule. However, it is not optimal in the sense of cycle time. Thus, to search for a better schedule, a Petri net model is developed for a dual-arm cluster tool with wafer revisit. With it, the properties of the 3-wafer schedule are analyzed. It is found that, to improve the performance, it is necessary to reduce the number of wafers completed in a cycle. Thus, a 1-wafer schedule is developed by using a new swap-based strategy.
Keywords
Petri nets; atomic layer deposition; machine tools; pattern clustering; scheduling; semiconductor device manufacture; wafer-scale integration; 3-wafer cyclic scheduling; ALD; Petri net-based scheduling analysis; atomic layer deposition; cluster tool scheduling; dual-arm cluster tool; dual-arm cluster tools; semiconductor fabrication; swap-based strategy; wafer fabrication processes; wafer revisiting; Firing; Load modeling; Robots; Schedules; Semiconductor device modeling; Steady-state; Transient analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Automation Science and Engineering (CASE), 2012 IEEE International Conference on
Conference_Location
Seoul
ISSN
2161-8070
Print_ISBN
978-1-4673-0429-0
Type
conf
DOI
10.1109/CoASE.2012.6386329
Filename
6386329
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