DocumentCode :
2601
Title :
Self-Rectifying Resistive-Switching Device With  \\hbox {a-Si/WO}_{3} Bilayer
Author :
Hangbing Lv ; Yingtao Li ; Qi Liu ; Shibing Long ; Ling Li ; Ming Liu
Author_Institution :
Lab. of Nano-Fabrication & Novel Devices Integrated Technol., Inst. of Microelectron., Beijing, China
Volume :
34
Issue :
2
fYear :
2013
fDate :
Feb. 2013
Firstpage :
229
Lastpage :
231
Abstract :
Resistive switching with a self-rectifying feature is one of the most effective solutions to overcome the sneaking current issue in a crossbar structure. In this letter, we have successfully demonstrated a prototype device with inherent rectifying property with a-Si/WO3 bilayer structure. After a forming process, the devices exhibit obvious rectifying property with forward/reverse current ratio of 102 at ±0.75 V and excellent reproducibility. The formation of localized conductive filaments (CFs) in the WO3 layer and the corresponding CF/a-Si Schottky contact are suggested to explain the rectifying behavior. The results in this letter demonstrate a possible way to realize selector-free crossbar structure.
Keywords :
Schottky barriers; elemental semiconductors; random-access storage; semiconductor switches; silicon; tungsten compounds; Schottky contact; Si-WO3; bilayer structure; forward-reverse current ratio; localized conductive filament formation; selector-free crossbar structure; self-rectifying BTMO RRAM device; self-rectifying resistive-switching device; Electrodes; Materials; Nanoscale devices; Resistance; Schottky barriers; Schottky diodes; Switches; Crossbar; resistive switching (RS); self-rectifying;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2232640
Filename :
6407728
Link To Document :
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