• DocumentCode
    2601
  • Title

    Self-Rectifying Resistive-Switching Device With  \\hbox {a-Si/WO}_{3} Bilayer

  • Author

    Hangbing Lv ; Yingtao Li ; Qi Liu ; Shibing Long ; Ling Li ; Ming Liu

  • Author_Institution
    Lab. of Nano-Fabrication & Novel Devices Integrated Technol., Inst. of Microelectron., Beijing, China
  • Volume
    34
  • Issue
    2
  • fYear
    2013
  • fDate
    Feb. 2013
  • Firstpage
    229
  • Lastpage
    231
  • Abstract
    Resistive switching with a self-rectifying feature is one of the most effective solutions to overcome the sneaking current issue in a crossbar structure. In this letter, we have successfully demonstrated a prototype device with inherent rectifying property with a-Si/WO3 bilayer structure. After a forming process, the devices exhibit obvious rectifying property with forward/reverse current ratio of 102 at ±0.75 V and excellent reproducibility. The formation of localized conductive filaments (CFs) in the WO3 layer and the corresponding CF/a-Si Schottky contact are suggested to explain the rectifying behavior. The results in this letter demonstrate a possible way to realize selector-free crossbar structure.
  • Keywords
    Schottky barriers; elemental semiconductors; random-access storage; semiconductor switches; silicon; tungsten compounds; Schottky contact; Si-WO3; bilayer structure; forward-reverse current ratio; localized conductive filament formation; selector-free crossbar structure; self-rectifying BTMO RRAM device; self-rectifying resistive-switching device; Electrodes; Materials; Nanoscale devices; Resistance; Schottky barriers; Schottky diodes; Switches; Crossbar; resistive switching (RS); self-rectifying;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2232640
  • Filename
    6407728