DocumentCode
2603164
Title
Application of a survey sampling critical area computation tool in a manufacturing environment [IC yield]
Author
Duvivier, Frederic ; Allan, Gerard A.
Author_Institution
Dept. of Device Eng., SGS-Thomson Microelectron., Crolles, France
fYear
1996
fDate
6-8 Nov 1996
Firstpage
48
Lastpage
52
Abstract
This paper reports on the use of a survey sampling based critical area estimation tool (EYES) within an industrial environment. The increase in extraction speed, the reduced resource requirements and ease of use enable efficient yield modelling. Result based on nine commercial devices averaging 1 million transistors with yields over a 23% range are presented
Keywords
electronic engineering computing; estimation theory; integrated circuit yield; EYES; IC manufacture; IC yield; extraction speed; industrial environment; manufacturing environment; survey sampling critical area computation tool; yield modelling; Algorithm design and analysis; Computer aided manufacturing; Eyes; Microelectronics; Predictive models; Pulp manufacturing; Sampling methods; Semiconductor device manufacture; Virtual manufacturing; Yield estimation;
fLanguage
English
Publisher
ieee
Conference_Titel
Defect and Fault Tolerance in VLSI Systems, 1996. Proceedings., 1996 IEEE International Symposium on
Conference_Location
Boston, MA
ISSN
1550-5774
Print_ISBN
0-8186-7545-4
Type
conf
DOI
10.1109/DFTVS.1996.571986
Filename
571986
Link To Document