• DocumentCode
    2603206
  • Title

    Process Technology - Gate Stack Process I - Fundamental Aspects

  • Author

    Chin, Albert ; De Gendt, Stefan

  • Author_Institution
    National Chiao Tung University
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    327
  • Lastpage
    327
  • Keywords
    CMOS process; CMOS technology; Crystal microstructure; Crystalline materials; Crystallization; High K dielectric materials; High-K gate dielectrics; Inorganic materials; Technological innovation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4418937
  • Filename
    4418937
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2603206