DocumentCode
2603705
Title
An Elusive Open-Circuit Failure Mode in Thin-Film Chip Resistors
Author
Cronshagen, A.H. ; Spriggs, R.S.
Author_Institution
Manager, Reliability, Aerojet ElectroSystems Company, 1100 West Hollyvale, Azusa, California 91702
fYear
1973
fDate
26755
Firstpage
54
Lastpage
60
Abstract
A unique open-circuit failure mode was observed in thin-film discrete chip resistors used in hybrid microelectronic devices. Their Nichrome resistance element is deposited over silicon dioxide (SiO2) on a silicon chip (30 by 30 mils) (0. 769 mm square). Termination pads of aluminum are provided to facilitate wire bonding. To enhance contact, a layer of titanium is interposed between the Nichroome and the aluminum. The resistor failures are caused by two factors: (1) excessive thickness of the Nichrome element, (2) use of excessively high processing temperatures to oxidize the Nichrome to the proper sheet resistance during wafer processing, which results in excessive alloying of the titanium and Nichrome materials. The latter produces an oxidized stress-sensitive interface between the Nichrome and titanium and results in time- and stress-dependent failures. Evidence of excessive reprocessing of the silicon wafers was also found, which may be a good indicator that the supplier was having process-control difficulties. Processes contributing to this failure mode and the controls that have been imposed to prevent recurrence are described.
Keywords
Aluminum; Microelectronics; Resistors; Silicon compounds; Temperature; Thin film devices; Titanium; Transistors; Wafer bonding; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1973. 11th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1973.362567
Filename
4207942
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