DocumentCode
2604471
Title
Nichrome Resistor Failures as Studied by X-ray Photoelectron Spectroscopy (XPS or ESCA)
Author
Baitinger, W.E. ; Winograd, N. ; Amy, J.W. ; Munarin, J.A.
Author_Institution
Department of Chemistry, Purdue University, West Lafayette, Indiana 47907
fYear
1974
fDate
27120
Firstpage
1
Lastpage
6
Abstract
Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using X-ray Photo-electron Spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occuring between metals and metal oxides.
Keywords
Chemical analysis; Chromium; Electrons; Energy measurement; Information analysis; Oxidation; Resistors; Spectroscopy; Sputtering; Surface cleaning;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1974.362619
Filename
4207997
Link To Document