DocumentCode
2604547
Title
Plasma Etching as Applied to Failure Analysis
Author
Jones, W. Kinzy
Author_Institution
The Charles Stark Draper Laboratory, Inc., 68 Albany Street, Cambridge, MA 02139
fYear
1974
fDate
27120
Firstpage
43
Lastpage
47
Keywords
Crystalline materials; Etching; Failure analysis; Optical control; Optical pumping; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1974.362625
Filename
4208003
Link To Document