DocumentCode
2604803
Title
Physics of Electromigration
Author
Black, James R.
Author_Institution
Motorola Semiconductor Products Division, 5005 E. McDowell Rd., Phoenix, Az 85008
fYear
1974
fDate
27120
Firstpage
142
Lastpage
149
Abstract
This survey paper on electromigration describes factors which govern the rate of electromigration and therefore relate to the lifetime of conductors stressed at high current density. These include the type of metal conductor, the conductor cross sectional area, lattice, grain boundary and surface diffusion effects, the addition of alloying elements, temperature and current density as well as the thermal conductivity of the substrate. The effect of gradients in temperature, current density, conductor composition and grain size on conductor lifetime are also discussed.
Keywords
Alloying; Conductors; Current density; Electromigration; Grain boundaries; Grain size; Lattices; Physics; Temperature; Thermal conductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1974.362640
Filename
4208018
Link To Document