DocumentCode :
2604803
Title :
Physics of Electromigration
Author :
Black, James R.
Author_Institution :
Motorola Semiconductor Products Division, 5005 E. McDowell Rd., Phoenix, Az 85008
fYear :
1974
fDate :
27120
Firstpage :
142
Lastpage :
149
Abstract :
This survey paper on electromigration describes factors which govern the rate of electromigration and therefore relate to the lifetime of conductors stressed at high current density. These include the type of metal conductor, the conductor cross sectional area, lattice, grain boundary and surface diffusion effects, the addition of alloying elements, temperature and current density as well as the thermal conductivity of the substrate. The effect of gradients in temperature, current density, conductor composition and grain size on conductor lifetime are also discussed.
Keywords :
Alloying; Conductors; Current density; Electromigration; Grain boundaries; Grain size; Lattices; Physics; Temperature; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1974.362640
Filename :
4208018
Link To Document :
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