• DocumentCode
    2604803
  • Title

    Physics of Electromigration

  • Author

    Black, James R.

  • Author_Institution
    Motorola Semiconductor Products Division, 5005 E. McDowell Rd., Phoenix, Az 85008
  • fYear
    1974
  • fDate
    27120
  • Firstpage
    142
  • Lastpage
    149
  • Abstract
    This survey paper on electromigration describes factors which govern the rate of electromigration and therefore relate to the lifetime of conductors stressed at high current density. These include the type of metal conductor, the conductor cross sectional area, lattice, grain boundary and surface diffusion effects, the addition of alloying elements, temperature and current density as well as the thermal conductivity of the substrate. The effect of gradients in temperature, current density, conductor composition and grain size on conductor lifetime are also discussed.
  • Keywords
    Alloying; Conductors; Current density; Electromigration; Grain boundaries; Grain size; Lattices; Physics; Temperature; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1974. 12th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1974.362640
  • Filename
    4208018