• DocumentCode
    2604854
  • Title

    The Effects of Phosphorus-Doped Passivation Glass on the Corrosion of Aluminum

  • Author

    Paulson, W.M. ; Kirk, R.W.

  • Author_Institution
    Materials Research Laboratory, Motorola Semiconductor Products Division, 5005 E. McDowell Road, Phoenix, Arizona 85008
  • fYear
    1974
  • fDate
    27120
  • Firstpage
    172
  • Lastpage
    179
  • Abstract
    The corrosion rate of aluminum metallization under bias was measured as a function of the phosphorus content of the CVD passivation glass under different temperature and humidity conditions. The electrolytic corrosion was the most intense at the negative electrode and the corrosion product was aluminum hydroxide Changing the phosphorus concentration from 2 to 10 wt. pct. increased the corrosion rate by a factor of 25. Increasing the relative humidity at 85°C from 85 to 100% caused the corrosion gate to increase by two orders of magnitude. A 30°C rise in temperature resulted in five times the corrosion rate. A model to account for the observed corrosion has been proposed.
  • Keywords
    Aluminum; Corrosion; Glass; Humidity; Metallization; Passivation; Plastics; Semiconductor devices; Stress; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1974. 12th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1974.362644
  • Filename
    4208022