• DocumentCode
    2605585
  • Title

    Simultaneous Extraction of Recoverable and Permanent Components Contributing to Bias-Temperature Instability

  • Author

    Grasser, T. ; Kaczer, B. ; Hehenberger, P. ; Gös, W. ; O´Connor, R. ; Reisinger, H. ; Gustin, Wolfgang ; Schunder, C.

  • Author_Institution
    TU Wien, Vienna
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    801
  • Lastpage
    804
  • Abstract
    Measuring the degradation of modern devices subjected to bias temperature stress has turned out to be a formidable challenge. Interestingly, measurement techniques such as fast- Vth, on-the-fly ID,lin, and charge-pumping give quite different results. This has often been explained by the inherent recovery in non-on-the-fly techniques. Still, all these techniques deliver important information on the degradation and recovery behavior and a rigorous understanding linking these results is still missing. Based on our detailed studies of the recovery, we propose a new measurement technique which allows the simultaneous extraction of two distinctly different components, a fast universally recovering component and a slow, nearly permanent component.
  • Keywords
    MOSFET; recovery; semiconductor device measurement; thermal stability; thermal stresses; MOS transistors; bias temperature stress; bias-temperature instability; device degradation measurement; measurement techniques; permanent components; recoverable components extraction; recovery behavior; transistor parameters; Charge pumps; Data mining; Degradation; Laboratories; MOSFETs; Measurement techniques; Plasma measurements; Plasma temperature; Pulse measurements; Stress measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4419069
  • Filename
    4419069