• DocumentCode
    2605594
  • Title

    Analysis of Deposited Glass Layer Defects

  • Author

    Bart, John J.

  • Author_Institution
    Rome Air Development Center, Reliability Branch, Reliability Physics Section, Griffiss Air Force Base, New York 13441
  • fYear
    1975
  • fDate
    27485
  • Firstpage
    128
  • Lastpage
    135
  • Abstract
    This paper reviews the results of deposited glass layer analysis carried out during device failure analysis and characterization studies performed at the Rome Air Development Center. The Scanning Electron Microscope (SEM) was used as the principal analysis technique for this study. The variables under consideration were glass deposition method, device interconnect metallurgy, package type and device stress conditions. The effects of glass layer defects on device reliability are discussed along with qualification and screen tests aimed at eliminating batch-related problems.
  • Keywords
    Aluminum; Failure analysis; Glass; Integrated circuit interconnections; Metallization; Packaging; Performance analysis; Protection; Scanning electron microscopy; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1975. 13th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1975.362686
  • Filename
    4208067