DocumentCode
2605594
Title
Analysis of Deposited Glass Layer Defects
Author
Bart, John J.
Author_Institution
Rome Air Development Center, Reliability Branch, Reliability Physics Section, Griffiss Air Force Base, New York 13441
fYear
1975
fDate
27485
Firstpage
128
Lastpage
135
Abstract
This paper reviews the results of deposited glass layer analysis carried out during device failure analysis and characterization studies performed at the Rome Air Development Center. The Scanning Electron Microscope (SEM) was used as the principal analysis technique for this study. The variables under consideration were glass deposition method, device interconnect metallurgy, package type and device stress conditions. The effects of glass layer defects on device reliability are discussed along with qualification and screen tests aimed at eliminating batch-related problems.
Keywords
Aluminum; Failure analysis; Glass; Integrated circuit interconnections; Metallization; Packaging; Performance analysis; Protection; Scanning electron microscopy; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1975. 13th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1975.362686
Filename
4208067
Link To Document