• DocumentCode
    2607612
  • Title

    Determination of Strain in 10μm Spots using a Microdiffractometer

  • Author

    Walker, G.A. ; Goldsmith, C.C.

  • Author_Institution
    IBM System Products Division, East Fishkill, Hopewell Junction, New York 12533
  • fYear
    1978
  • fDate
    18-20 April 1978
  • Firstpage
    56
  • Lastpage
    58
  • Abstract
    High strain fields in composite structures can cause failure due to cracking of ceramic or Si or peeling of thin films. With the trend toward smaller devices/packages, geometry effects play a role through stress concentration, and it is therefore, necessary to measure strain in small areas. Examples of strain measurement on test samples from lO¿m spots, using an X-ray microdiffractometer, are given and the technique is described.
  • Keywords
    Area measurement; Capacitive sensors; Optical films; Optical microscopy; Packaging; Radiation detectors; Strain measurement; Stress measurement; Transistors; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1978. 16th Annual
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1978.362818
  • Filename
    4208208
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2607612