DocumentCode :
2607660
Title :
Random Telegraph Signals and 1/f Noise in ZnO Nanowire Field Effect Transistors
Author :
Xiong, Hao D. ; Wang, Wenyong ; Li, Qiliang ; Richter, Curt A. ; Suehle, John S. ; Hong, Woong-Ki ; Lee, Takhee ; Fleetwood, Daniel M.
Author_Institution :
Semicond. Electron. Div., Nat. Inst. of Stand. & Technol., Gaithersburg, MD
fYear :
2007
fDate :
2-5 Aug. 2007
Firstpage :
1139
Lastpage :
1143
Abstract :
Single-crystal ZnO nanowires have been fabricated as field effect transistors (FETs). The low frequency noise in the drain current of n-type ZnO FETs has been investigated through random telegraph signals (RTSs) at 4.2 K and 1/f noise at room temperature. At room temperature, the noise power spectra have a classic 1/f dependence with a Hooge parameter that is ~ 5 times 10-3. ZnO FETs measured in a dry O2 - environment displayed elevated noise levels that can be attributed to increased fluctuations associated with O2 - on the nanowire surfaces. At 4.2 K, the deviceiquests noise spectra change from 1/f to Lorentzian type, and the current traces as a function of time show random telegraph signals (RTSs). The channel current RTSs are attributed to correlated carrier number and mobility fluctuation due to the trapping and emission of carriers by discrete border traps. At certain bias conditions, the current in the channel shows three-level switching events with amplitudes as high as 40 %, from which two individual defects with energies close to the Fermi level in the ZnO channel can be distinguished.
Keywords :
Fermi level; II-VI semiconductors; carrier mobility; crystal defects; current fluctuations; electron traps; field effect transistors; hole traps; nanowires; semiconductor quantum wires; wide band gap semiconductors; zinc compounds; Fermi level; Hooge parameter; Lorentzian type; ZnO; carrier mobility fluctuation; carrier number; carrier trapping; defects; drain current; n-type nanowire field effect transistors; noise power spectra; random telegraph signals; temperature 293 K to 298 K; temperature 4.2 K; three-level switching events; FETs; Fluctuations; Integrated circuit noise; Low-frequency noise; MOSFETs; Nanoscale devices; Noise reduction; Semiconductor device noise; Telegraphy; Zinc oxide; 1/f noise; Signal; ZnO; nanowire; oxide trap; random Telegraph;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-0607-4
Electronic_ISBN :
978-1-4244-0608-1
Type :
conf
DOI :
10.1109/NANO.2007.4601384
Filename :
4601384
Link To Document :
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