DocumentCode
2607785
Title
Scanning Electron Microscopy for Complex Microcircuit Analysis
Author
Bart, John J.
Author_Institution
Rome Air Development Center, Reliability Physics Section, Griffiss AFB NY 13441. (315) 330-2306
fYear
1978
fDate
28581
Firstpage
108
Lastpage
111
Abstract
Scanning electron microscopy has become an important approach to evaluating both the structural and electrical causes of device failure in complex large scale integrated circuits. This paper will review current activities within the Reliability Branch at RADC which cover assessing device electrical operation using the voltage contrast mode of SEM operation. Important features of the SEM will be described along with a comparison of the voltage contrast information with the data obtained on identical circuits using field effect liquid crystal display techniques. The limitations of SEM analysis of surface sensitive devices will be discussed along with recommendations for a multi-technique approach to complex microcircuit reliability evaluation.
Keywords
Electron beams; Electronic equipment testing; Frequency; Information analysis; Liquid crystal devices; Liquid crystal displays; Pulse amplifiers; Scanning electron microscopy; TV; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1978. 16th Annual
Conference_Location
San Diego, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1978.362830
Filename
4208220
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