• DocumentCode
    2607785
  • Title

    Scanning Electron Microscopy for Complex Microcircuit Analysis

  • Author

    Bart, John J.

  • Author_Institution
    Rome Air Development Center, Reliability Physics Section, Griffiss AFB NY 13441. (315) 330-2306
  • fYear
    1978
  • fDate
    28581
  • Firstpage
    108
  • Lastpage
    111
  • Abstract
    Scanning electron microscopy has become an important approach to evaluating both the structural and electrical causes of device failure in complex large scale integrated circuits. This paper will review current activities within the Reliability Branch at RADC which cover assessing device electrical operation using the voltage contrast mode of SEM operation. Important features of the SEM will be described along with a comparison of the voltage contrast information with the data obtained on identical circuits using field effect liquid crystal display techniques. The limitations of SEM analysis of surface sensitive devices will be discussed along with recommendations for a multi-technique approach to complex microcircuit reliability evaluation.
  • Keywords
    Electron beams; Electronic equipment testing; Frequency; Information analysis; Liquid crystal devices; Liquid crystal displays; Pulse amplifiers; Scanning electron microscopy; TV; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1978. 16th Annual
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1978.362830
  • Filename
    4208220