• DocumentCode
    2607790
  • Title

    High performance electron and hole current switching in double-hetero tunnel-junction n-i-p quantum dot transistor

  • Author

    Fujihashi, Chugo

  • fYear
    2007
  • fDate
    2-5 Aug. 2007
  • Firstpage
    1174
  • Lastpage
    1178
  • Abstract
    A double-hetero tunnel-junction structure is introduced to the electron and hole current switching n-i-p type quantum dot transistor to improve its switching clearness. Previously the n-i-p type semiconductor quantum dot transistor was suggested on a first step model of an idea of electron and hole current switching including no recombination effect in a quantum dot and simply based on a homo tunnel-junction structure. Results in this paper show that there is some degree of recombination current in the homo tunnel-junction type and it is difficult to obtain an adequate clearness of switching performance, and newly introduced double-hetero tunnel-junction structure suppresses the recombination current and it gives a way to obtain a sufficient switching clearness.
  • Keywords
    semiconductor device models; semiconductor heterojunctions; semiconductor quantum dots; tunnel transistors; double-hetero tunnel-junction n-i-p quantum dot transistor; double-hetero tunnel-junction structure; electron current switching; hole current switching; homo tunnel-junction structure; recombination current; Charge carrier processes; Electrons; Integrated circuit technology; Quantum dots; Quantum mechanics; Radiative recombination; Spontaneous emission; Switches; Transistors; Voltage; Double-hetero tunnel-junction; Electron and hole currents; N-i-p structure; Quantum dot transistor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-0607-4
  • Electronic_ISBN
    978-1-4244-0608-1
  • Type

    conf

  • DOI
    10.1109/NANO.2007.4601392
  • Filename
    4601392