DocumentCode
2608056
Title
Characterization and modeling of Al2O3 MIM capacitors: temperature and electrical field effects
Author
Bécu, S. ; Crémer, S. ; Noblanc, O. ; Autran, J.-L. ; Delpech, P.
fYear
2005
fDate
12-16 Sept. 2005
Firstpage
265
Lastpage
268
Abstract
This paper deals with the capacitance response of metal-insulator-metal (MIM) structures with 15 nm thick Al2O3 as dielectric. Electrical characterizations between 100 K and 450 K have been performed to study the temperature effect on the capacitance. An original model assuming that the permanent moment of the polar molecules in the Al2O3 film grows linearly with temperature is exposed to explain the experimental results.
Keywords
MIM devices; aluminium compounds; capacitors; dielectric materials; electric field effects; semiconductor device models; 100 to 450 K; 15 nm; Al2O3; MIM capacitors; capacitance response; electrical characterization; electrical field effects; metal-insulator-metal structures; permanent moment; polar molecules; temperature effects; Capacitance; Capacitance-voltage characteristics; Dielectric materials; MIM capacitors; Microelectronics; Passive filters; Radio frequency; Semiconductor device modeling; Temperature dependence; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN
0-7803-9203-5
Type
conf
DOI
10.1109/ESSDER.2005.1546636
Filename
1546636
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