Direct current magnetron sputter-deposited ZnO thin films

Author

Krishnasamy, Jegenathan ; Chan, Kah-Yoong ; Hoon, Jian-Wei ; Kamaruddin, Sharul Ashikin Binti ; Tou, Teck-Yong

Author_Institution

Fac. of Eng., Multimedia Univ., Cyberjaya, Malaysia

fYear

2010

fDate

5-7 July 2010

Firstpage

1

Lastpage

3

Abstract

Zinc oxide (ZnO) thin films were deposited on glass substrates at room temperature using direct current (DC) magnetron sputtering technique. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influence of the deposition pressure on structural properties of the ZnO films was investigated using atomic force microscopy (AFM). The optical properties of the ZnO films were measured using Ocean Optics spectrometer. The experimental results reveal that the deposition pressure has an important role in the structural and optical properties of the ZnO films.

Keywords

II-VI semiconductors; atomic force microscopy; infrared spectra; light transmission; semiconductor growth; semiconductor thin films; sputter deposition; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; Ocean Optics spectrometer; ZnO; atomic force microscopy; direct current magnetron sputtering technique; optical properties; optical transmittance; pressure 12 mtorr to 25 mtorr; structural properties; temperature 293 K to 298 K; thin films; Glass; Integrated optics; Optical films; Sputtering; Substrates; Zinc oxide; DC magnetron sputtering; Structural properties and Optical properties; Zinc oxide; ZnO;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics (ICP), 2010 International Conference on

Conference_Location

Langkawi, Kedah

Print_ISBN

978-1-4244-7186-7

Type

conf

DOI

10.1109/ICP.2010.5604395

Filename

5604395