DocumentCode
2609032
Title
The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry
Author
Froot, H.A.
Author_Institution
International Business Machines Corporation, Data Systems Division, Hopewell Junction, New York 12533. (914) 897-4960
fYear
1979
fDate
28946
Firstpage
190
Lastpage
192
Abstract
A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.
Keywords
Contamination; Fingerprint recognition; Fluorescence; Manufacturing industries; Manufacturing processes; Mercury (metals); Process control; Semiconductor device manufacture; Semiconductor devices; Xenon;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1979. 17th Annual
Conference_Location
San Diego, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1979.362892
Filename
4208285
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