Title :
Instability and Failure Mechanisms of Small Area, Nitride-Defined Schottky Barrier Diodes, in LSI Applications
Author_Institution :
IBM General Technology Division, Essex Junction, Vermont 05452
Keywords :
Equations; Etching; Failure analysis; Integrated circuit technology; Large scale integration; Leakage current; Schottky barriers; Schottky diodes; Silicon; Surface treatment;
Conference_Titel :
Reliability Physics Symposium, 1979. 17th Annual
Conference_Location :
San Diego, CA, USA
DOI :
10.1109/IRPS.1979.362898