• DocumentCode
    2609640
  • Title

    The use of Plasma Chemistry in Failure Analysis

  • Author

    Pfarr, Michael ; Hart, Arthur

  • Author_Institution
    Tegal Corporation, 528 Weddell Dr. Su. 5, Sunnyvale, CA. 94086, (408) 744-0872
  • fYear
    1980
  • fDate
    29312
  • Firstpage
    110
  • Lastpage
    114
  • Abstract
    Recently, low temperature plasmas of excited gasses have been used to selectively remove materials for analytical purposes. In replacing high herrperature ashing or wet chemical digestiorn, the plasma treatment has proven valuab le because of its selectivity, gentleness, cleanliness and safety. With this method, one can avoid volatile mineral losses, phase changes, trace contaminations and undesireable material loss. This process has particular applications in Failure Analysis with the removal of plastic encapsulations and passivation layers.
  • Keywords
    Chemicals; Contamination; Failure analysis; Minerals; Phase change materials; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Safety;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1980. 18th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1980.362924
  • Filename
    4208320