DocumentCode
2609640
Title
The use of Plasma Chemistry in Failure Analysis
Author
Pfarr, Michael ; Hart, Arthur
Author_Institution
Tegal Corporation, 528 Weddell Dr. Su. 5, Sunnyvale, CA. 94086, (408) 744-0872
fYear
1980
fDate
29312
Firstpage
110
Lastpage
114
Abstract
Recently, low temperature plasmas of excited gasses have been used to selectively remove materials for analytical purposes. In replacing high herrperature ashing or wet chemical digestiorn, the plasma treatment has proven valuab le because of its selectivity, gentleness, cleanliness and safety. With this method, one can avoid volatile mineral losses, phase changes, trace contaminations and undesireable material loss. This process has particular applications in Failure Analysis with the removal of plastic encapsulations and passivation layers.
Keywords
Chemicals; Contamination; Failure analysis; Minerals; Phase change materials; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Safety;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1980. 18th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1980.362924
Filename
4208320
Link To Document