DocumentCode :
2610020
Title :
UV radiation hardness of silicon inversion layer solar cells
Author :
Hezel, R.
Author_Institution :
Int. fur Werkstoffwissenschaften, Erlangen-Nuernberg Univ., Germany
fYear :
1990
fDate :
21-25 May 1990
Firstpage :
239
Abstract :
For full utilization of the high spectral response of inversion-layer solar cells in the very-short-wavelength range of the solar spectrum, sufficient ultraviolet-radiation hardness is required. In addition to the charge-induced passivation achieved by incorporating cesium into the silicon nitride AR coating, the following means for further drastic reduction of UV-light-induced effects in inversion-layer solar cells without encapsulation are introduced and interpretations are given: increasing the nitride deposition temperature, silicon surface oxidation at low temperatures, texture etching, and using higher substrate resistivities. High UV radiation tolerance and improvement of the cell efficiency can be obtained simultaneously
Keywords :
elemental semiconductors; radiation hardening; silicon; solar cells; Si inversion layer solar cells; UV radiation hardness; charge-induced passivation; efficiency; solar spectrum; spectral response; substrate resistivities; surface oxidation; texture etching; Coatings; Conductivity; Encapsulation; Etching; Oxidation; Passivation; Photovoltaic cells; Silicon; Surface texture; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
Type :
conf
DOI :
10.1109/PVSC.1990.111624
Filename :
111624
Link To Document :
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