• DocumentCode
    2610268
  • Title

    Reliability Aspects of a Floating Gate E2 PROM

  • Author

    Euzent, Bruce ; Boruta, Nick ; Lee, Jimmy ; Jenq, Ching

  • Author_Institution
    INTEL CORPORATION, Santa Clara, California 95051. (408) 987-8080
  • fYear
    1981
  • fDate
    29677
  • Firstpage
    11
  • Lastpage
    16
  • Abstract
    This paper has discussed a number of E2PROM failure mechanisms for both erase/write cycling and data retention. It has been shown that Fowler-Nordheim tunneling used for programming does not affect data retention. Erase/write cycling has been shown to degrade device margins by only a small amount and is easily guardbanded. Erase/write cycling does contribute to a significant portion of the observed failure rate due to oxide breakdown under high field operation. Defect related charge loss has been shown to be similar to that observed in EPROMs. Finally, it has been shown that E2PROMs can perform reliably in applications requiring up to 10,000 erase/write cycles per byte.
  • Keywords
    Application software; Character generation; Electrons; Failure analysis; Nonvolatile memory; PROM; Tunneling; Variable structure systems; Voltage; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1981. 19th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1981.362965
  • Filename
    4208364