DocumentCode :
2610549
Title :
Precision Crosssectional Analysis of LSI and VLSI Devices
Author :
Angelides, Peter G.
Author_Institution :
Metallographic Industries, 1190 Miraloma Way, Suite W, Sunnyvale, CA. 94086
fYear :
1981
fDate :
29677
Firstpage :
134
Lastpage :
138
Abstract :
This is a tutorial paper describing and illustrating a crosssectional procedure for LSI and VLSI devices. The significant results using this procedure are one to one measurements of circuit parameters and a very clear view of the crosssectioned circuit at any given point. It is thus possible to measure with ease dimensions in the 0.3 micron range using the light microscope.
Keywords :
Building materials; Circuits; Inorganic materials; Large scale integration; Machining; Metals industry; Microscopy; Packaging; Time measurement; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1981. 19th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1981.362985
Filename :
4208384
Link To Document :
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