DocumentCode
2610757
Title
Giant piezoresistance effect in p-type silicon
Author
Nghiêm, T. T Trang ; Aubry-Fortuna, V. ; Chassat, C. ; Bosseboeuf, A. ; Dollfus, P.
Author_Institution
Inst. d´´Electron. Fondamentale, Univ. Paris-Sud - CNRS, Orsay, France
fYear
2010
fDate
6-8 Sept. 2010
Firstpage
321
Lastpage
324
Abstract
This article presents a study of the giant piezoresistance effect in p-type silicon using full-band Monte Carlo simulation. This effect has been demonstrated experimentally in Si nanowires by He and Yang. By introducing a law of variation of the surface potential according to the applied mechanical stress, we can reproduce this effect. The modulation of the width of the depletion region associated with the variation of surface potential induces a strong modulation of the total amount of carriers available for the conduction, which increases drastically this piezoresistive effect. This is probably the main origin of this effect, which may be used to achieve high performance MEMS sensors.
Keywords
Monte Carlo methods; carrier density; elemental semiconductors; micromechanical devices; piezoresistance; silicon; surface potential; MEMS sensors; Si; applied mechanical stress; depletion region width modulation; full-band Monte Carlo simulation; giant piezoresistance effect; law of variation; microelectromechanical systems; p-type silicon; piezoresistive effect; surface potential; total carrier amount modulation; Conductivity; Mathematical model; Monte Carlo methods; Nanowires; Piezoresistance; Silicon; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location
Bologna
ISSN
1946-1569
Print_ISBN
978-1-4244-7701-2
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2010.5604493
Filename
5604493
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