DocumentCode :
2610757
Title :
Giant piezoresistance effect in p-type silicon
Author :
Nghiêm, T. T Trang ; Aubry-Fortuna, V. ; Chassat, C. ; Bosseboeuf, A. ; Dollfus, P.
Author_Institution :
Inst. d´´Electron. Fondamentale, Univ. Paris-Sud - CNRS, Orsay, France
fYear :
2010
fDate :
6-8 Sept. 2010
Firstpage :
321
Lastpage :
324
Abstract :
This article presents a study of the giant piezoresistance effect in p-type silicon using full-band Monte Carlo simulation. This effect has been demonstrated experimentally in Si nanowires by He and Yang. By introducing a law of variation of the surface potential according to the applied mechanical stress, we can reproduce this effect. The modulation of the width of the depletion region associated with the variation of surface potential induces a strong modulation of the total amount of carriers available for the conduction, which increases drastically this piezoresistive effect. This is probably the main origin of this effect, which may be used to achieve high performance MEMS sensors.
Keywords :
Monte Carlo methods; carrier density; elemental semiconductors; micromechanical devices; piezoresistance; silicon; surface potential; MEMS sensors; Si; applied mechanical stress; depletion region width modulation; full-band Monte Carlo simulation; giant piezoresistance effect; law of variation; microelectromechanical systems; p-type silicon; piezoresistive effect; surface potential; total carrier amount modulation; Conductivity; Mathematical model; Monte Carlo methods; Nanowires; Piezoresistance; Silicon; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location :
Bologna
ISSN :
1946-1569
Print_ISBN :
978-1-4244-7701-2
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2010.5604493
Filename :
5604493
Link To Document :
بازگشت