• DocumentCode
    2610757
  • Title

    Giant piezoresistance effect in p-type silicon

  • Author

    Nghiêm, T. T Trang ; Aubry-Fortuna, V. ; Chassat, C. ; Bosseboeuf, A. ; Dollfus, P.

  • Author_Institution
    Inst. d´´Electron. Fondamentale, Univ. Paris-Sud - CNRS, Orsay, France
  • fYear
    2010
  • fDate
    6-8 Sept. 2010
  • Firstpage
    321
  • Lastpage
    324
  • Abstract
    This article presents a study of the giant piezoresistance effect in p-type silicon using full-band Monte Carlo simulation. This effect has been demonstrated experimentally in Si nanowires by He and Yang. By introducing a law of variation of the surface potential according to the applied mechanical stress, we can reproduce this effect. The modulation of the width of the depletion region associated with the variation of surface potential induces a strong modulation of the total amount of carriers available for the conduction, which increases drastically this piezoresistive effect. This is probably the main origin of this effect, which may be used to achieve high performance MEMS sensors.
  • Keywords
    Monte Carlo methods; carrier density; elemental semiconductors; micromechanical devices; piezoresistance; silicon; surface potential; MEMS sensors; Si; applied mechanical stress; depletion region width modulation; full-band Monte Carlo simulation; giant piezoresistance effect; law of variation; microelectromechanical systems; p-type silicon; piezoresistive effect; surface potential; total carrier amount modulation; Conductivity; Mathematical model; Monte Carlo methods; Nanowires; Piezoresistance; Silicon; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
  • Conference_Location
    Bologna
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-7701-2
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2010.5604493
  • Filename
    5604493