DocumentCode
2610776
Title
Statistics of Defect Related Breakdown
Author
Shatzkes, M. ; Av-Ron, M.
Author_Institution
IBM General Technology Division, East Fishkill, Dept. 270-B/300-403, Hopewell Junction, NY 12533. (914) 897-6302
fYear
1981
fDate
29677
Firstpage
210
Lastpage
211
Abstract
An analysis of dielectric breakdown is presented under the assumption that breakdown events occurring at defect-free regions (intrinsic) and-at defects are independent. The yield as function of time, when the defects are Poisson distributed, is a product of factors reflecting defect-related and intrinsic breakdown. Explicit results are given for various tests commonly used in studies of dielectric reliability. A statistical model of dielectric breakdown is required for precise reliability projections and for assessment of dielectric quality from data obtained in breakdown tests. Such a model was developed by Solomon, Klein and Albert1 for defect free insulators. We2,3 derived a model incorporating the effects of defects and presented results for the case where all defects were the same type, i.e., the probability for breakdown at each defect being the same. Our purpose here is to extend our analysis to the case of multiple defect types and to further elucidate the implications of our model.
Keywords
Dielectric breakdown; Dielectrics and electrical insulation; Electric breakdown; Frequency locked loops; Statistical analysis; Statistics; Temperature dependence; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1981. 19th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1981.362998
Filename
4208397
Link To Document