Reaction Kinetics of Al Films with Phosphosilicate Glass (PSG) in Semiconductors

Author

Digiacomo, C.

Author_Institution

International Business Machines Corporation, P. O. Box 390, Poughkeepsie, New York 12602

fYear

1981

fDate

29677

Firstpage

218

Lastpage

222

Keywords

Annealing; Corrosion; Glass; Humidity; Kinetic theory; Life estimation; Semiconductor films; Silicon; Stability; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Reliability Physics Symposium, 1981. 19th Annual

Conference_Location

Las Vegas, NV, USA

ISSN

0735-0791

Type

DOI

10.1109/IRPS.1981.363000

Filename

4208399

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