• DocumentCode
    2611013
  • Title

    Symmetry reduction by surface scattering and mobility model for stressed 〈100〉/(001) MOSFETs

  • Author

    Bufler, F.M. ; Erlebach, A. ; Oulmane, M.

  • Author_Institution
    Inst. fur Integrierte Syst., ETH Zurich, Zurich, Switzerland
  • fYear
    2010
  • fDate
    6-8 Sept. 2010
  • Firstpage
    275
  • Lastpage
    278
  • Abstract
    It is demonstrated that the gate interface breaks the equivalence between vertical and transverse direction for the mobility in 〈100〉/(001) pMOSFETs, leading to 6 instead of 3 independent 1st order piezoconductance coefficients. This is found from Monte Carlo (MC) simulations yielding different effective mobilities for uniaxial vertical and transverse stress, which can be explained in terms of energy and parallel-momentum conservation upon specular surface scattering. A mobility model with stress-dependent 1st order piezoconductance coefficients is presented. This model is shown to reproduce well corresponding MC effective mobilities not only for low, but also for high stress.
  • Keywords
    MOSFET; Monte Carlo methods; carrier mobility; electric admittance; piezoresistance; semiconductor device models; semiconductor process modelling; surface scattering; Monte Carlo simulations; effective mobility model; energy conservation; gate interface; metal-oxide-semiconductor field effect transistor; parallel-momentum conservation; specular surface scattering model; stress-dependent 1st order piezoconductance coefficients; stressed pMOSFET; transverse direction mobility; uniaxial transverse stress; uniaxial vertical stress; vertical direction mobility; Logic gates; MOSFETs; Monte Carlo methods; Piezoresistance; Scattering; Silicon; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
  • Conference_Location
    Bologna
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-7701-2
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2010.5604508
  • Filename
    5604508