DocumentCode
2611013
Title
Symmetry reduction by surface scattering and mobility model for stressed 〈100〉/(001) MOSFETs
Author
Bufler, F.M. ; Erlebach, A. ; Oulmane, M.
Author_Institution
Inst. fur Integrierte Syst., ETH Zurich, Zurich, Switzerland
fYear
2010
fDate
6-8 Sept. 2010
Firstpage
275
Lastpage
278
Abstract
It is demonstrated that the gate interface breaks the equivalence between vertical and transverse direction for the mobility in 〈100〉/(001) pMOSFETs, leading to 6 instead of 3 independent 1st order piezoconductance coefficients. This is found from Monte Carlo (MC) simulations yielding different effective mobilities for uniaxial vertical and transverse stress, which can be explained in terms of energy and parallel-momentum conservation upon specular surface scattering. A mobility model with stress-dependent 1st order piezoconductance coefficients is presented. This model is shown to reproduce well corresponding MC effective mobilities not only for low, but also for high stress.
Keywords
MOSFET; Monte Carlo methods; carrier mobility; electric admittance; piezoresistance; semiconductor device models; semiconductor process modelling; surface scattering; Monte Carlo simulations; effective mobility model; energy conservation; gate interface; metal-oxide-semiconductor field effect transistor; parallel-momentum conservation; specular surface scattering model; stress-dependent 1st order piezoconductance coefficients; stressed pMOSFET; transverse direction mobility; uniaxial transverse stress; uniaxial vertical stress; vertical direction mobility; Logic gates; MOSFETs; Monte Carlo methods; Piezoresistance; Scattering; Silicon; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location
Bologna
ISSN
1946-1569
Print_ISBN
978-1-4244-7701-2
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2010.5604508
Filename
5604508
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