DocumentCode :
2611165
Title :
Stochastic modeling hysteresis and resistive switching in bipolar oxide-based memory
Author :
Makarov, Alexander ; Sverdlov, Viktor ; Selberherr, Siegfried
Author_Institution :
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear :
2010
fDate :
6-8 Sept. 2010
Firstpage :
237
Lastpage :
240
Abstract :
We have developed a stochastic model of the resistive switching mechanism in resistive random access memory (RRAM) based on electron hopping. The distribution of electron occupation probabilities obtained with our approach is in good agreement with previous work. In particular, a low occupation region is formed near the cathode for bipolar switching behavior or near the anode for unipolar switching behavior. This result indicates that a decrease of the switching time with increasing temperature cannot be explained only by reduced occupations of the vacancies in the low occupation region, but is related to an increase of the mobility of the oxide ions. A hysteresis cycle of RRAM switching simulated with our stochastic model is in good agreement with experimental results.
Keywords :
integrated circuit modelling; random-access storage; switching circuits; RRAM switching; bipolar oxide-based memory; bipolar switching; electron hopping; resistive random access memory; resistive switching; stochastic modeling hysteresis; Electrodes; Hysteresis; Ions; Random access memory; Resistance; Stochastic processes; Switches; Monte Carlo method; RRAM; resistive switching mechanism; stochastic model;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location :
Bologna
ISSN :
1946-1569
Print_ISBN :
978-1-4244-7701-2
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2010.5604517
Filename :
5604517
Link To Document :
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