Title :
Precision VLSI Cross-Sectioning and Staining
Author :
MIlls, T. ; Sponheimer, E.W.
Author_Institution :
Hewlett Packard Company, Computer Integrated Circuits Division, 3400 Harmony Road, Ft. Collins, Colorado, 303-226-3800
Abstract :
This paper describes a unique and novel approach to VLSI cross-sectioning. It incorporates the discipline needed to achieve cross-sectioning to any given area on an integrated circuit to within ± 0.2 microns with a greater than 90% confidence level. Coupled to the precision cross-sectioning technique a stain was formulated and refined to enhance the observation by scanning electron microscopy of sub-surface, sub-micron features. This provides the failure analyst a powerful technique to assist in the analysis of complex VLSI devises.
Keywords :
Concurrent computing; Etching; Failure analysis; Fixtures; Implants; Lapping; Magnetic analysis; Milling machines; Steel; Very large scale integration;
Conference_Titel :
Reliability Physics Symposium, 1982. 20th Annual
Conference_Location :
San Diego, NV, USa
DOI :
10.1109/IRPS.1982.361930