• DocumentCode
    2611584
  • Title

    Precision VLSI Cross-Sectioning and Staining

  • Author

    MIlls, T. ; Sponheimer, E.W.

  • Author_Institution
    Hewlett Packard Company, Computer Integrated Circuits Division, 3400 Harmony Road, Ft. Collins, Colorado, 303-226-3800
  • fYear
    1982
  • fDate
    30011
  • Firstpage
    214
  • Lastpage
    220
  • Abstract
    This paper describes a unique and novel approach to VLSI cross-sectioning. It incorporates the discipline needed to achieve cross-sectioning to any given area on an integrated circuit to within ± 0.2 microns with a greater than 90% confidence level. Coupled to the precision cross-sectioning technique a stain was formulated and refined to enhance the observation by scanning electron microscopy of sub-surface, sub-micron features. This provides the failure analyst a powerful technique to assist in the analysis of complex VLSI devises.
  • Keywords
    Concurrent computing; Etching; Failure analysis; Fixtures; Implants; Lapping; Magnetic analysis; Milling machines; Steel; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1982. 20th Annual
  • Conference_Location
    San Diego, NV, USa
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1982.361930
  • Filename
    4208448