• DocumentCode
    2611743
  • Title

    Diffusivity of Moisture in Thin Films

  • Author

    McInerney, Edward J. ; Flinn, Paul A.

  • Author_Institution
    Intel Corporation, 3065 Bowers Avenue, Santa Clara, CA 95051
  • fYear
    1982
  • fDate
    30011
  • Firstpage
    264
  • Lastpage
    267
  • Abstract
    Absorption of moisture by thin films produces a volume increase which changes the film stress toward compression. This effect is the basis of a new technique for measuring water diffusivity. The diffusion coefficient is determined by a least squares fit of the stress data to the diffusion equation, with appropriate boundary conditions. This technique provides a fast, quantitative supplement to the traditional bias-temperature-humidity stress testing. The differences in diffusivities of common passivations are substantial; phosphosilicate glasses are orders of magnitude higher than plasma nitrides. Diffusivities for several passivation materials are given.
  • Keywords
    Absorption; Boundary conditions; Equations; Glass; Least squares methods; Moisture; Passivation; Stress; Testing; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1982. 20th Annual
  • Conference_Location
    San Diego, NV, USa
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1982.361940
  • Filename
    4208458