DocumentCode
2611743
Title
Diffusivity of Moisture in Thin Films
Author
McInerney, Edward J. ; Flinn, Paul A.
Author_Institution
Intel Corporation, 3065 Bowers Avenue, Santa Clara, CA 95051
fYear
1982
fDate
30011
Firstpage
264
Lastpage
267
Abstract
Absorption of moisture by thin films produces a volume increase which changes the film stress toward compression. This effect is the basis of a new technique for measuring water diffusivity. The diffusion coefficient is determined by a least squares fit of the stress data to the diffusion equation, with appropriate boundary conditions. This technique provides a fast, quantitative supplement to the traditional bias-temperature-humidity stress testing. The differences in diffusivities of common passivations are substantial; phosphosilicate glasses are orders of magnitude higher than plasma nitrides. Diffusivities for several passivation materials are given.
Keywords
Absorption; Boundary conditions; Equations; Glass; Least squares methods; Moisture; Passivation; Stress; Testing; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1982. 20th Annual
Conference_Location
San Diego, NV, USa
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1982.361940
Filename
4208458
Link To Document