DocumentCode
2612086
Title
RF-current de-confinement in III-V HFETs
Author
Dickmann, J. ; Kohn, E. ; Strahle, S. ; Wiersch, A. ; Künzel, H. ; Lee, H. ; Nickel, H.
Author_Institution
Daimler-Benz, Res. Center, Ulm, Germany
fYear
1991
fDate
5-7 Aug 1991
Firstpage
435
Lastpage
444
Abstract
A criterion for the carrier confinement in III-V HFETs is derived from the linear correlation between the two ratios C gs/C gd and g m/g ds, where C gs is the gate/source capacitance, C gd is the gate/drain capacitance, g m is the transconductance, and g ds is the output conductance. FETs of a number of distinctly different layer structures have been compared on this basis. The model finds carrier flow confinement dominated by the structural aspect ratio and the extension of the drain region. In the RF analysis no evidence for additional confinement of hot carriers by a deep-quantum-well channel configuration is found either in GaAs-based or in InP-based material systems
Keywords
III-V semiconductors; carrier mobility; high electron mobility transistors; hot carriers; GaAs; HEMT; III-V HFETs; InP; RF current deconfinement; carrier confinement; deep-quantum-well channel configuration; gate/drain capacitance; gate/source capacitance; hot carriers; output conductance; structural aspect ratio; transconductance; Capacitance; Carrier confinement; Circuits; FETs; Gallium arsenide; HEMTs; Hot carriers; III-V semiconductor materials; Indium phosphide; MODFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
High Speed Semiconductor Devices and Circuits, 1991., Proceedings IEEE/Cornell Conference on Advanced Concepts in
Conference_Location
Ithaca, NY
Print_ISBN
0-7803-0491-8
Type
conf
DOI
10.1109/CORNEL.1991.170013
Filename
170013
Link To Document