Title :
Characterization of low temperature GaAs buffer
Author :
Tadayon, Bijan ; Fatemi, M. ; Tadayon, Saied ; Moore, F. ; Katzer, S. ; Dietrich, H.
Author_Institution :
US Naval Res. Lab., Washington, DC, USA
Abstract :
A study of the electrical and physical characteristics of GaAs buffer layers grown at low temperatures as a function of substrate temperature, TS, is discussed. Three approximate temperature ranges with different electrical properties were identified: high (TS⩾460°C), intermediate (280°C⩽TS⩽420°C), and low (TS⩽250°C). In the high range, the lattice parameter of the epilayer is the same as that of GaAs. In the intermediate range, the perpendicular lattice parameter of the epilayer is larger than and the in-plane lattice parameter is equal to that of GaAs. In the low range, the epilayer appears to be polycrystalline or amorphous. For the high and intermediate ranges, the epilayers are the color of ordinary GaAs. However, for the low range, the epilayers have a gold tint. Hall measurements were performed on the as-grown samples and annealed samples. Samples of the high and intermediate ranges remained highly resistive after annealing while usually high carrier concentrations were observed for 850°C-annealed low range samples, 8.8×1017 to 1.5×1018 cm3, with mobilities of 490 to 920 cm2 V-1 s-1
Keywords :
Hall effect; III-V semiconductors; annealing; carrier density; electrical conductivity of amorphous semiconductors and insulators; electronic conduction in crystalline semiconductor thin films; gallium arsenide; molecular beam epitaxial growth; semiconductor epitaxial layers; semiconductor growth; 250 to 850 degC; Hall measurements; amorphous layer; annealing; carrier concentrations; electrical properties; epilayer; growth temperature; in-plane lattice parameter; low temperature GaAs buffer; perpendicular lattice parameter; physical characteristics; polycrystalline layer; semiconductors; substrate temperature; Annealing; Buffer layers; Calibration; Gallium arsenide; Laboratories; Molecular beam epitaxial growth; Optical buffering; Substrates; Surface morphology; Temperature distribution;
Conference_Titel :
High Speed Semiconductor Devices and Circuits, 1991., Proceedings IEEE/Cornell Conference on Advanced Concepts in
Conference_Location :
Ithaca, NY
Print_ISBN :
0-7803-0491-8
DOI :
10.1109/CORNEL.1991.170040