DocumentCode
2613183
Title
Determination of Reliability from Ramped Voltage Breakdown Experiments; Application to Dual Dielectric MIM Capacitors
Author
Shatzkes, M. ; Av-Ron, M. ; Srikrishnan, K.V.
Author_Institution
IBM General Technology Division, East Fishkill, Hopewell Junction, New York 12533
fYear
1984
fDate
30773
Firstpage
138
Lastpage
139
Abstract
Ramped voltage breakdown experiments were used to derive the dependence of life-time, ¿(v), on the applied voltage for Ta2O5-Si3N4 dual dielectric capacitors. Techniques previously described allowed for recognition of defective capacitors, which break down early, and for the effect of trapping of injected carriers, which retards the breakdown. It is there. ore possible to determine ¿(v) for charge-free nondefective capacitors--a quantity of interest for reliability. For nonoptimistic reliability projections, ¿(v) must be obtained over a range in voltage so that log ¿(v) versus v exhibits, at the lower portion of that range, an upward concavity. Projections thus obtained were verified in a life-test.
Keywords
Aging; Breakdown voltage; Dielectric breakdown; Electric breakdown; Life testing; MIM capacitors; MOS capacitors; Monitoring; Performance evaluation;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1984. 22nd Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1984.362032
Filename
4208556
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