• DocumentCode
    2613183
  • Title

    Determination of Reliability from Ramped Voltage Breakdown Experiments; Application to Dual Dielectric MIM Capacitors

  • Author

    Shatzkes, M. ; Av-Ron, M. ; Srikrishnan, K.V.

  • Author_Institution
    IBM General Technology Division, East Fishkill, Hopewell Junction, New York 12533
  • fYear
    1984
  • fDate
    30773
  • Firstpage
    138
  • Lastpage
    139
  • Abstract
    Ramped voltage breakdown experiments were used to derive the dependence of life-time, ¿(v), on the applied voltage for Ta2O5-Si3N4 dual dielectric capacitors. Techniques previously described allowed for recognition of defective capacitors, which break down early, and for the effect of trapping of injected carriers, which retards the breakdown. It is there. ore possible to determine ¿(v) for charge-free nondefective capacitors--a quantity of interest for reliability. For nonoptimistic reliability projections, ¿(v) must be obtained over a range in voltage so that log ¿(v) versus v exhibits, at the lower portion of that range, an upward concavity. Projections thus obtained were verified in a life-test.
  • Keywords
    Aging; Breakdown voltage; Dielectric breakdown; Electric breakdown; Life testing; MIM capacitors; MOS capacitors; Monitoring; Performance evaluation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1984. 22nd Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1984.362032
  • Filename
    4208556