DocumentCode :
2613183
Title :
Determination of Reliability from Ramped Voltage Breakdown Experiments; Application to Dual Dielectric MIM Capacitors
Author :
Shatzkes, M. ; Av-Ron, M. ; Srikrishnan, K.V.
Author_Institution :
IBM General Technology Division, East Fishkill, Hopewell Junction, New York 12533
fYear :
1984
fDate :
30773
Firstpage :
138
Lastpage :
139
Abstract :
Ramped voltage breakdown experiments were used to derive the dependence of life-time, ¿(v), on the applied voltage for Ta2O5-Si3N4 dual dielectric capacitors. Techniques previously described allowed for recognition of defective capacitors, which break down early, and for the effect of trapping of injected carriers, which retards the breakdown. It is there. ore possible to determine ¿(v) for charge-free nondefective capacitors--a quantity of interest for reliability. For nonoptimistic reliability projections, ¿(v) must be obtained over a range in voltage so that log ¿(v) versus v exhibits, at the lower portion of that range, an upward concavity. Projections thus obtained were verified in a life-test.
Keywords :
Aging; Breakdown voltage; Dielectric breakdown; Electric breakdown; Life testing; MIM capacitors; MOS capacitors; Monitoring; Performance evaluation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1984. 22nd Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1984.362032
Filename :
4208556
Link To Document :
بازگشت