• DocumentCode
    2613856
  • Title

    Investigation Into GaAs Power MESFET Surface Degradation

  • Author

    Dumas, J.M. ; Lecrosnier, D. ; Bresse, J.F.

  • Author_Institution
    Centre National d´´Etudes des Télécommunications, BP 40, 22301 LANNION - France
  • fYear
    1985
  • fDate
    31107
  • Firstpage
    39
  • Lastpage
    44
  • Abstract
    Long term degradation of GaAs power MESFETs is shown to be surface-induced. - C.V.D. SiO2 protected FETs are investigated in part 1 : using micro-Auger analysis (beam spot size ¿0.1 - 0.2 ¿m), we have identified a Gallium outdiffusion induced by the SiO2 surface protection deposition and a GaAs oxidation mechanism during electrical operation. These reactions modify the electrical surface properties in the access regions explaining the R.F. and D.C. performances degradation. This part I constitutes the body of this communication. - part II : After a review of our results on unprotected FETs, a plasma enhanced chemical vapor deposited silicon nitride layer is shown to be a suitable passivation.
  • Keywords
    Chemicals; Degradation; FETs; Gallium arsenide; MESFETs; Oxidation; Plasma chemistry; Plasma properties; Protection; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1985. 23rd Annual
  • Conference_Location
    Orlando, FL, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1985.362072
  • Filename
    4208599