DocumentCode
2614413
Title
The Identification and Elimination of Human Contamination in the Manufacture of IC´s
Author
Thomas, Robert W. ; Calabrese, Donald W.
Author_Institution
Rome Air Development Center (RBRE), Griffiss AFB NY 13441-5700, (315) 330-3730
fYear
1985
fDate
31107
Firstpage
228
Lastpage
234
Abstract
The semiconductor industry has come a long way in the campaign to eliminate the major failure mechanisms from its product. The battles against moisture, sodium, migration, purple plague, pin holes, and oxide breakdown have been largely won. Current mature product reliability has reached the 100 FIT level and there is every reason to take satisfaction in this achievement. Recently, there have been several costly systems failures that have been traced to random contamination originating from the human body. Thus circuits which have achieved an enviable generic reliability track record may also experience a small number of random failures. Since these random failures can cause complete system failure in automobiles as well as spacecraft, it is now appropriate to take a close look at the source of contamination, the way in which it reaches the circuit, and the methods to eliminate it. In this paper, the human sources of contamination were examined in detail. The chemical nature of skin, hair, sweat, spittle and mucus was documented. The method of transmission such as talking and coughing will be graphically demonstrated in a movie utilizing dark field techniques to illustrate the not so obvious extent of human contamination projection during talking. Next the SEM and EDAX were used to identify the contamination once it was deposited on the wafer or chip. Spittle was identified by the characteristically round spots containing a large amount of potassium chloride as the main constituent.
Keywords
Automobiles; Circuits; Contamination; Electric breakdown; Electronics industry; Failure analysis; Humans; Manufacturing; Moisture; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1985. 23rd Annual
Conference_Location
Orlando, FL, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1985.362102
Filename
4208629
Link To Document