DocumentCode
2614687
Title
Infrared Microscopy as Applied to Failure Analysis of P-DIP Devices
Author
Lewis, Stephen H.
Author_Institution
IBM, MS 1803 P.O. Box 1328, Boca Raton, Florida 33432
fYear
1986
fDate
31503
Firstpage
99
Lastpage
101
Abstract
Infrared microscopy is an important tool to the failure analyst, and its uses in failure mode identification are becoming more varied and numerous. Recent advances in equipment have enabled high magnification examination with very good resolution when analyzing plastic encapsulated devices from the backside of the die. This paper will discuss various anomalies observable with this technique as well as sample preparation techniques and a description of the IR equipment used.
Keywords
Aluminum; Circuits; Corrosion; Earth Observing System; Failure analysis; Intermetallic; Land surface; Microscopy; Plastics; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location
Anaheim, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1986.362117
Filename
4208648
Link To Document