DocumentCode :
2614687
Title :
Infrared Microscopy as Applied to Failure Analysis of P-DIP Devices
Author :
Lewis, Stephen H.
Author_Institution :
IBM, MS 1803 P.O. Box 1328, Boca Raton, Florida 33432
fYear :
1986
fDate :
31503
Firstpage :
99
Lastpage :
101
Abstract :
Infrared microscopy is an important tool to the failure analyst, and its uses in failure mode identification are becoming more varied and numerous. Recent advances in equipment have enabled high magnification examination with very good resolution when analyzing plastic encapsulated devices from the backside of the die. This paper will discuss various anomalies observable with this technique as well as sample preparation techniques and a description of the IR equipment used.
Keywords :
Aluminum; Circuits; Corrosion; Earth Observing System; Failure analysis; Intermetallic; Land surface; Microscopy; Plastics; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location :
Anaheim, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1986.362117
Filename :
4208648
Link To Document :
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