DocumentCode
2614690
Title
a-SiGe:H alloy material limitations and device considerations
Author
Fortmann, C.M.
fYear
1990
fDate
21-25 May 1990
Firstpage
1493
Abstract
The electron mobility of intrinsic amorphous SiGe films is found to depend on the hydrogen content. Deposition conditions that influence hydrogen content are discussed. The best C H a-SiGe:H alloys of 1.3 eV bandgap are used in solar cells. Solar cell analysis is used to determine both hole and electron transport. It is shown that the electron mobility is reduced by alloying; however, the hole transport of the alloy is not significantly different from that of device-quality a-Si:H. Cell designs that minimize performance loss due to poor electron mobility are considered. The results obtained indicate that an ideal a-SiGe:H-based solar cell would be graded from a-SiGe:H near the front to a-Si:H at the back of the cell. Careful consideration must also be given to hole interface recombination at the contact as the holes generated deep in the i-layer have a reasonable chance to be allocated. The hole transport of the alloy is relatively good compared to that of a-Si:H or to the electron transport in a-S:G:H
Keywords
Ge-Si alloys; amorphous semiconductors; carrier mobility; electron-hole recombination; hydrogen; solar cells; amorphous SiGe:H solar cells; contact; deposition conditions; electron mobility; electron transport; hole interface recombination; hole transport; performance loss; Alloying; Amorphous materials; Charge carrier processes; Electron mobility; Germanium silicon alloys; Hydrogen; Performance loss; Photonic band gap; Photovoltaic cells; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location
Kissimmee, FL
Type
conf
DOI
10.1109/PVSC.1990.111857
Filename
111857
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