• DocumentCode
    2614690
  • Title

    a-SiGe:H alloy material limitations and device considerations

  • Author

    Fortmann, C.M.

  • fYear
    1990
  • fDate
    21-25 May 1990
  • Firstpage
    1493
  • Abstract
    The electron mobility of intrinsic amorphous SiGe films is found to depend on the hydrogen content. Deposition conditions that influence hydrogen content are discussed. The best CH a-SiGe:H alloys of 1.3 eV bandgap are used in solar cells. Solar cell analysis is used to determine both hole and electron transport. It is shown that the electron mobility is reduced by alloying; however, the hole transport of the alloy is not significantly different from that of device-quality a-Si:H. Cell designs that minimize performance loss due to poor electron mobility are considered. The results obtained indicate that an ideal a-SiGe:H-based solar cell would be graded from a-SiGe:H near the front to a-Si:H at the back of the cell. Careful consideration must also be given to hole interface recombination at the contact as the holes generated deep in the i-layer have a reasonable chance to be allocated. The hole transport of the alloy is relatively good compared to that of a-Si:H or to the electron transport in a-S:G:H
  • Keywords
    Ge-Si alloys; amorphous semiconductors; carrier mobility; electron-hole recombination; hydrogen; solar cells; amorphous SiGe:H solar cells; contact; deposition conditions; electron mobility; electron transport; hole interface recombination; hole transport; performance loss; Alloying; Amorphous materials; Charge carrier processes; Electron mobility; Germanium silicon alloys; Hydrogen; Performance loss; Photonic band gap; Photovoltaic cells; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
  • Conference_Location
    Kissimmee, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.1990.111857
  • Filename
    111857