DocumentCode
2614951
Title
Staelber-Wronski effect in hydrogenated amorphous germanium films
Author
Graeff, C.F.d.O. ; Santos, P.V. ; Marcano, G. ; Chambouleyron, I.
Author_Institution
Inst. of Phys., Univ. Estadual de Campinas, Sao Paulo, Brazil
fYear
1990
fDate
21-25 May 1990
Firstpage
1564
Abstract
The authors report on the optoelectronic properties of high-quality a-Ge:H films prepared by the RF sputtering method and on their photodegradation resulting from light soaking at different temperatures and under different irradiation conditions (Staebler-Wronski effect). The material parameters of interest for solar device manufacturing presented are among the best reported to date: a low density of electron states in the pseudogap, a temperature-activated dark conductivity (E a⩾0.5 eV) down to below 200 K, and a photo-to-dark conductivity ratio of up to 2.0 under AM1 conditions. The dark conductivity and the photoconductivity of the a-Ge:H samples decrease after light soaking. The changes are metastable and both the defect formation and the defect annealing processes are temperature activated. As in the case of a-Si:H films, the time evolution of the conductivity changes is well represented by a stretched exponential type of decay with activated time constants
Keywords
Staebler-Wronski effect; amorphous semiconductors; annealing; elemental semiconductors; germanium; hydrogen; photoconductivity; semiconductor thin films; solar cells; sputtered coatings; RF sputtering method; Staelber-Wronski; amorphous Ge:H films; annealing processes; light soaking; low density of electron states; optoelectronic properties; photo-to-dark conductivity ratio; photodegradation; pseudogap; semiconductor; solar device manufacturing; temperature-activated dark conductivity; Amorphous materials; Conducting materials; Conductivity; Electrons; Germanium; Manufacturing; Photoconductivity; Radio frequency; Sputtering; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location
Kissimmee, FL
Type
conf
DOI
10.1109/PVSC.1990.111871
Filename
111871
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