DocumentCode :
2615029
Title :
Controlled Surface Contamination to Determine Surface Sensitivity of HVICS
Author :
Osenbach, J.W. ; Comizzoli, R.B. ; Voris, S.S.
Author_Institution :
AT&T - Bell Laboratories, 2525 North 12th Street, Reading, Pennsylvania 19604
fYear :
1986
fDate :
31503
Firstpage :
239
Lastpage :
246
Abstract :
We report a technique that allows one to deposit on devices a controllable level of contamination as low as 108 atoms/cm2. Using this technique we were able to determine that surface contamination alone does not lead to reduced breakdown voltage of our high voltage PIN diodes. Good devices are essentially immune to surface contamination; however, "bad" devices are very sensitive to contamination. Contamination on the order of 1010 atoms/cm2 reduces the breakdown voltage of a defective diode by over 100V. We have proposed one possible model which describes the dependence of the breakdown voltage of a high voltage device on the applied bias, concentration of contamination, and field plate design. This model is based on the double layer theory of ionic solutions.
Keywords :
Atomic layer deposition; Breakdown voltage; Dielectric devices; Humidity; Passivation; Semiconductor devices; Semiconductor diodes; Silicon; Surface contamination; Surface cracks;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location :
Anaheim, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1986.362140
Filename :
4208671
Link To Document :
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