DocumentCode
2615213
Title
Device design for a raised extrinsic base SiGe bipolar technology
Author
Haralson, Erik ; Malm, Gunnar ; Ostling, Mikael
Author_Institution
Dept. of Microelectron. & Inf. Technol., Royal Inst. of Technol., Kista-Stockholm, Sweden
fYear
2003
fDate
10-12 Dec. 2003
Firstpage
57
Lastpage
58
Abstract
This paper describes a systematic 2-D simulation study with ISE TCAD in which the SIC has been investigated through a design of experiments (DOE). A central composite response surface design was used to model the effect of the SIC width (WSIC), and emitter width (WE) on the AC and DC performance of a HBT with a raised extrinsic base. In addition to the device simulations, Monte Carlo process simulations of the SIC implantation showed that for smaller WE values the lateral straggle has a larger relative impact on the final SIC profile. This vertical profile design was used to obtain high fT and fMAX values comparable to demonstrated state of the art HBTs.
Keywords
Ge-Si alloys; Monte Carlo methods; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; technology CAD (electronics); 2-D simulation; DOE; HBT; Monte Carlo process simulations; SiGe; TCAD; computer-aided design; device design; extrinsic base SiGe bipolar technology; selectively implanted collector; technology CAD; Design optimization; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Information technology; Microelectronics; Response surface methodology; Silicon carbide; Silicon germanium; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2003 International
Print_ISBN
0-7803-8139-4
Type
conf
DOI
10.1109/ISDRS.2003.1271994
Filename
1271994
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