• DocumentCode
    2615213
  • Title

    Device design for a raised extrinsic base SiGe bipolar technology

  • Author

    Haralson, Erik ; Malm, Gunnar ; Ostling, Mikael

  • Author_Institution
    Dept. of Microelectron. & Inf. Technol., Royal Inst. of Technol., Kista-Stockholm, Sweden
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    57
  • Lastpage
    58
  • Abstract
    This paper describes a systematic 2-D simulation study with ISE TCAD in which the SIC has been investigated through a design of experiments (DOE). A central composite response surface design was used to model the effect of the SIC width (WSIC), and emitter width (WE) on the AC and DC performance of a HBT with a raised extrinsic base. In addition to the device simulations, Monte Carlo process simulations of the SIC implantation showed that for smaller WE values the lateral straggle has a larger relative impact on the final SIC profile. This vertical profile design was used to obtain high fT and fMAX values comparable to demonstrated state of the art HBTs.
  • Keywords
    Ge-Si alloys; Monte Carlo methods; heterojunction bipolar transistors; semiconductor device models; semiconductor materials; technology CAD (electronics); 2-D simulation; DOE; HBT; Monte Carlo process simulations; SiGe; TCAD; computer-aided design; device design; extrinsic base SiGe bipolar technology; selectively implanted collector; technology CAD; Design optimization; Doping profiles; Germanium silicon alloys; Heterojunction bipolar transistors; Information technology; Microelectronics; Response surface methodology; Silicon carbide; Silicon germanium; US Department of Energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1271994
  • Filename
    1271994