DocumentCode :
2615272
Title :
Saturation behavior of the light-induced defect density in hydrogenated amorphous silicon [solar cells]
Author :
Park, H.R. ; Liu, J.Z. ; Cabarrocas, P. Roca i ; Maruyama, A. ; Isomura, M. ; Wagner, S. ; Abelson, J.R. ; Finger, F.
Author_Institution :
Dept. of Electr. Eng., Princeton Univ., NJ, USA
fYear :
1990
fDate :
21-25 May 1990
Firstpage :
1642
Abstract :
The light-induced generation of defects in a-Si:H(F) was saturated by a few hours of illumination with Kr-ion-laser light soaking (λ=647.1 nm) near room temperature. The time to reach saturation scales roughly with 1/G2, but the saturation value is essentially independent of the illumination intensity. Therefore, the saturation is not due to thermal annealing. The saturation values of the light-induced defect density in 37 a-Si:H(F) samples which had been grown in six different reactors over a range of conditions were measured. These a-Si:H(F) samples have annealed-state defect densities in the range of 1.1×1015 to 1.6×1016 cm-3, Urbach energies of 42-62 meV, and Tauc optical bandgaps of 1.61 to 1.83 eV. The saturation value rises from 5×1016 to 2×1017 cm-3 with increasing optical gap and total hydrogen content, but it is not correlated with the Urbach energy or with the annealed-state defect density
Keywords :
amorphous semiconductors; defect electron energy states; elemental semiconductors; hydrogen; silicon; solar cells; Kr ion laser light soaking; Tauc optical bandgaps; Urbach energies; amorphous Si-H solar cells; illumination intensity; light-induced defect density; Amorphous silicon; Annealing; Hydrogen; Inductors; Laser theory; Lighting; Optical films; Optical saturation; Radio frequency; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
Type :
conf
DOI :
10.1109/PVSC.1990.111887
Filename :
111887
Link To Document :
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