• DocumentCode
    2615283
  • Title

    Dynamic Imaging of Current Conduction in Dielectric Films by Emission Microscopy

  • Author

    Khurana, Neeraj ; Chiang, Ching-Lang

  • Author_Institution
    Intel Corp., 3605 Bowers Ave., Santa Clara, CA 95501. (408) 496-4125
  • fYear
    1987
  • fDate
    31868
  • Firstpage
    72
  • Lastpage
    76
  • Abstract
    Real time images of the dielectric breakdown were shown in a movie produced by Emission Microscopy. We show that a faint light is emitted during current conduction through dielectric films. Current flows through a large area in an undamaged oxide. Upon breakdown the current flow immediately constricts into a tiny point. Current flow at asperities dances around between multiple asperities. This behavior can be understood as a result of electron trapping and detrapping in the vicinity of poly asperities. Emission Microscopy is the only known technique for viewing current localization at asperities. It is also the most sensitive and the fastest technique for locating oxide defects in VLSI products.
  • Keywords
    Dielectric breakdown; Dielectric films; Electron emission; Image intensifiers; Image processing; Optical computing; Optical films; Optical microscopy; Optical sensors; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1987. 25th Annual
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1987.362158
  • Filename
    4208692