DocumentCode
2615283
Title
Dynamic Imaging of Current Conduction in Dielectric Films by Emission Microscopy
Author
Khurana, Neeraj ; Chiang, Ching-Lang
Author_Institution
Intel Corp., 3605 Bowers Ave., Santa Clara, CA 95501. (408) 496-4125
fYear
1987
fDate
31868
Firstpage
72
Lastpage
76
Abstract
Real time images of the dielectric breakdown were shown in a movie produced by Emission Microscopy. We show that a faint light is emitted during current conduction through dielectric films. Current flows through a large area in an undamaged oxide. Upon breakdown the current flow immediately constricts into a tiny point. Current flow at asperities dances around between multiple asperities. This behavior can be understood as a result of electron trapping and detrapping in the vicinity of poly asperities. Emission Microscopy is the only known technique for viewing current localization at asperities. It is also the most sensitive and the fastest technique for locating oxide defects in VLSI products.
Keywords
Dielectric breakdown; Dielectric films; Electron emission; Image intensifiers; Image processing; Optical computing; Optical films; Optical microscopy; Optical sensors; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1987. 25th Annual
Conference_Location
San Diego, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1987.362158
Filename
4208692
Link To Document