Title :
Diffusion and native defects in GaAs
Author_Institution :
Dept. of Mater. Sci. & Eng., Utah Univ., Salt Lake City, UT, USA
Abstract :
Native defects, i.e., vacancies and interstitials, are responsible for controlling the diffusion of atoms in GaAs. Three classes of experimental design are available to probe native defects: equilibrium, weak nonequilibrium, and strong nonequilibrium. The necessary and sufficient conditions required to define and quickly bring the native defect concentrations to their equilibrium values are discussed. Experimental results are presented which show that native defect equilibrium can be approximated in practice, and used to determine that interdiffusion of either Al or In occurs via a Ga vacancy, with a charge of -1, in both n- and p-type GaAs. Strong nonequilibrium which applies when substantial mass transfer occurs, is of little help in understanding diffusion. Weak nonequilibrium corresponds to a perturbation in the equilibrium concentration of one native defect. Such experiments have been used to show that positively charged Zn and Ga interstitials are the first defects in the crystal to equilibrate with the ambient vapor
Keywords :
III-V semiconductors; diffusion; gallium arsenide; impurity-defect interactions; interstitials; vacancies (crystal); Ga vacancy; GaAs:Zn; diffusion; emitter push effect; equilibrium; interdiffusion marker; interstitials; mass transfer; n-type GaAs; native defects; p-type GaAs; positively charged interstitials; strong nonequilibrium; vacancies; weak nonequilibrium; Cities and towns; Design for experiments; Gallium arsenide; Impurities; Materials science and technology; Optoelectronic devices; Probes; Sufficient conditions; Weight control; Zinc;
Conference_Titel :
Optoelectronic and Microelectronic Materials And Devices Proceedings, 1996 Conference on
Conference_Location :
Canberra, ACT
Print_ISBN :
0-7803-3374-8
DOI :
10.1109/COMMAD.1996.610084