DocumentCode
2615309
Title
Improved stability in amorphous silicon germanium solar cells made from hydrogen-diluted silane and germane
Author
Bennett, M.S. ; Catalano, A. ; Rajan, K. ; Arya, R.R.
Author_Institution
Solarex Corp., Newtown, PA, USA
fYear
1990
fDate
21-25 May 1990
Firstpage
1653
Abstract
Amorphous hydrogenated silicon germanium p-i-n heterojunction solar cells with a-SiGe:H i-layers were deposited in one case from a glow discharge of SiH4 and GeH4 diluted in H2 , and, in a second case, from a discharge of SiH4 and GeH4 with no dilution. The cells made from these two discharges had very similar initial conversion efficiencies; however, those having i-layers deposited in the presence ofH2-dilution were more stable against light-induced degradation. This may be a result of improved material properties as indicated by infrared and Raman analysis
Keywords
Ge-Si alloys; amorphous semiconductors; hydrogen; solar cells; stability; IR analysis; Raman analysis; amorphous SiGe:H solar cells; light-induced degradation; p-i-n heterojunction solar cells; stability; Amorphous materials; Amorphous silicon; Degradation; Germanium silicon alloys; Glow discharges; Heterojunctions; PIN photodiodes; Photovoltaic cells; Silicon germanium; Stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location
Kissimmee, FL
Type
conf
DOI
10.1109/PVSC.1990.111889
Filename
111889
Link To Document