• DocumentCode
    2615309
  • Title

    Improved stability in amorphous silicon germanium solar cells made from hydrogen-diluted silane and germane

  • Author

    Bennett, M.S. ; Catalano, A. ; Rajan, K. ; Arya, R.R.

  • Author_Institution
    Solarex Corp., Newtown, PA, USA
  • fYear
    1990
  • fDate
    21-25 May 1990
  • Firstpage
    1653
  • Abstract
    Amorphous hydrogenated silicon germanium p-i-n heterojunction solar cells with a-SiGe:H i-layers were deposited in one case from a glow discharge of SiH4 and GeH4 diluted in H2 , and, in a second case, from a discharge of SiH4 and GeH4 with no dilution. The cells made from these two discharges had very similar initial conversion efficiencies; however, those having i-layers deposited in the presence ofH2-dilution were more stable against light-induced degradation. This may be a result of improved material properties as indicated by infrared and Raman analysis
  • Keywords
    Ge-Si alloys; amorphous semiconductors; hydrogen; solar cells; stability; IR analysis; Raman analysis; amorphous SiGe:H solar cells; light-induced degradation; p-i-n heterojunction solar cells; stability; Amorphous materials; Amorphous silicon; Degradation; Germanium silicon alloys; Glow discharges; Heterojunctions; PIN photodiodes; Photovoltaic cells; Silicon germanium; Stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
  • Conference_Location
    Kissimmee, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.1990.111889
  • Filename
    111889