• DocumentCode
    2615503
  • Title

    Pulsed Current Electromigration Failure Model

  • Author

    Brooke, Laura

  • Author_Institution
    Digital Equipment Corporation, 75 Reed Road, Hudson, MA 01749-2809
  • fYear
    1987
  • fDate
    31868
  • Firstpage
    136
  • Lastpage
    139
  • Abstract
    The electromigration failure rate in conductors carrying rectangular current waveforms is a function of temperature, stress current density, period, and duty cycle or total on-time. This study used constant current lifetests to determine activation energy and current density acceleration, and correlated this lifetime to that obtained during pulsed current stress. A time-average current density, JDC, has been determined in an Al1%Si metal system for current densities between 0.3 and 2.0 MA/cm2 and duty cycles between 20 and 100% at 500 kHz and 175°C. The median time-to-failure for a rectangular waveform was best expressed as t50 = Ao(JDC)-n eEA/KT for a duty cycle between 20 and 100% at 500kHz and 175°C.
  • Keywords
    Acceleration; Conductive films; Conductors; Current density; Dielectrics; Electromigration; Passivation; Plasma temperature; Stress; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1987. 25th Annual
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1987.362169
  • Filename
    4208703