DocumentCode :
2615503
Title :
Pulsed Current Electromigration Failure Model
Author :
Brooke, Laura
Author_Institution :
Digital Equipment Corporation, 75 Reed Road, Hudson, MA 01749-2809
fYear :
1987
fDate :
31868
Firstpage :
136
Lastpage :
139
Abstract :
The electromigration failure rate in conductors carrying rectangular current waveforms is a function of temperature, stress current density, period, and duty cycle or total on-time. This study used constant current lifetests to determine activation energy and current density acceleration, and correlated this lifetime to that obtained during pulsed current stress. A time-average current density, JDC, has been determined in an Al1%Si metal system for current densities between 0.3 and 2.0 MA/cm2 and duty cycles between 20 and 100% at 500 kHz and 175°C. The median time-to-failure for a rectangular waveform was best expressed as t50 = Ao(JDC)-n eEA/KT for a duty cycle between 20 and 100% at 500kHz and 175°C.
Keywords :
Acceleration; Conductive films; Conductors; Current density; Dielectrics; Electromigration; Passivation; Plasma temperature; Stress; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1987. 25th Annual
Conference_Location :
San Diego, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1987.362169
Filename :
4208703
Link To Document :
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