• DocumentCode
    2615782
  • Title

    Impurity and defect centers of n-type 4H-SiC single crystals investigated by a photoluminescence and a piezoelectric photo thermal spectroscopy

  • Author

    Sakai, K. ; Fukuyama, A. ; Shigetomi, S. ; Ikari, T.

  • Author_Institution
    Frontier Sci. Res. Center, Miyazaki Univ., Japan
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    128
  • Lastpage
    129
  • Abstract
    The deep defect level in n-type 4H-SiC single crystal were investigated from the two physical viewpoints of non-radiative and radiative recombination by using PPT and PL techniques, respectively. Three peaks appear at 2.10, 2.35 and 2.80 eV in the PL spectra and two broad peaks appear around 2.2 and 2.7 eV in the PPT spectra. These were explained by the electron transition through impurity and a defect levels with a phonon relaxation process in terms of the CC model. The strong electron-lattice interaction in the electron transition is understood by those two high sensitivity techniques.
  • Keywords
    deep levels; impurities; nonradiative transitions; phonons; photoluminescence; photothermal effects; silicon compounds; wide band gap semiconductors; SiC; deep defect levels; defect centers; electron radiative transition; electron-lattice interaction; impurities; n-type 4H-SiC single crystals; nonradiative transition; phonon relaxation; photoluminescence; piezoelectric photo thermal spectra; Crystals; Electrons; Impurities; Nitrogen; Photoluminescence; Radiative recombination; Silicon carbide; Spectroscopy; Temperature; Thermal engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1272027
  • Filename
    1272027